Low, Andrew Chun Wey and Damideh, Vahid* and Saw, S. H. and Lim, Chin Seong* (2016) Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite. Key Engineering Materials, 701. pp. 42-46. ISSN 1662-9795
Full text not available from this repository.Abstract
This paper reports the deposition of carbon nanomaterials on silicon substrate using a dense plasma focus device. The film property is studied using a field emission scanning electron microscopy (FESEM) and energy dispersive X-ray (EDX). The first test was deposited using 1, 3, 5, and 7 focus shots while the second test was carried out using 1 focus shot at 2, 3, 4, 5 and 7 Torr. Both tests were conducted with neon as filling gas at 7 Torr at distance of 8cm from the anode tip. In the first test, FESEM images exhibit a non-homogenous, non-uniformed and largely agglomerated carbon deposition at all films as pressure of filling gas increases. The EDX mapping confirms that carbon content in substrate increases from 10% to 30% as number of shot increases, and there is more carbon content detected in the centre position than the off-centre position. There is also a decrease in carbon content 35% to 25% as pressure of gas increases.
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | Dense Plasma Focus, Graphene, Thin Film Deposition |
| Subjects: | Q Science > QC Physics |
| Divisions: | Centre for Plasma Research |
| Depositing User: | Unnamed user with email masilah.mansor@newinti.edu.my |
| Date Deposited: | 22 Nov 2017 05:26 |
| Last Modified: | 22 Nov 2017 05:26 |
| URI: | http://eprints.intimal.edu.my/id/eprint/980 |
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