Ho, Soon Min (2017) Characterization of nickel lead sulphide thin films: X-Ray diffraction studies. ARPN Journal of Engineering and Applied Sciences, 12 (15). pp. 4378-4382. ISSN 1819-6608
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Abstract
In this work, nickel lead sulphide thin films were grown by inexpensive and simple method, namely chemical bath deposition technique. Nickel sulphate, sodium thiosulfate and lead nitrate as the sources of Ni2+, S2- and Pb2+ ions, respectively. The effect of deposition period will be studied from 8 to 34 hours at room temperature. The obtained films were characterized by X-ray diffraction. The results reveal that the number of peaks was increased from two to five peaks as the deposition time increased up to 34 hours. In other words, more materials will be deposited onto substrates for longer deposition time.
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | thin films, x-ray diffraction, metal chalcogenide. |
| Subjects: | T Technology > TA Engineering (General). Civil engineering (General) |
| Divisions: | Faculty of Engineering & Quantity Surveying |
| Depositing User: | Unnamed user with email masilah.mansor@newinti.edu.my |
| Date Deposited: | 16 Nov 2017 06:12 |
| Last Modified: | 16 Nov 2017 06:12 |
| URI: | http://eprints.intimal.edu.my/id/eprint/958 |
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