Preparation and characterization of tungsten oxide thin films

Ho, Soon Min (2016) Preparation and characterization of tungsten oxide thin films. Journal of Chemical and Pharmaceutical Research, 8 (7). pp. 414-416. ISSN 0975-7384

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Abstract

The present review article deals with the deposition technique for the preparation of tungsten oxide films. There are several different methods of deposition were widely used including screen printing method, electrophoretic deposition, thermal evaporation, pulsed laser deposition method, sol gel spin coating deposition, radio frequency reactive magnetron sputter deposition and chemical bath deposition technique as described by many researchers. Xray diffraction was used to determine the structure of obtained films. The X-ray diffraction patterns indicate that the as-deposited films and annealed films are amorphous and crystallite, respectively.

Item Type: Article
Additional Information: Scopus ID: 56701569600
Uncontrolled Keywords: Tungsten oxide, thin films, semiconductor, deposition, film thickness.
Subjects: T Technology > TA Engineering (General). Civil engineering (General)
Divisions: Faculty of Engineering, Science and Mathematics > School of Engineering and Quantity Surveying
Depositing User: Unnamed user with email masilah.mansor@newinti.edu.my
Date Deposited: 12 Aug 2016 06:52
Last Modified: 24 Nov 2016 08:26
URI: http://eprints.intimal.edu.my/id/eprint/491

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