Atomic Force Microscopy Studies on the Surface Morphologies of Chemical Bath Deposited CuS Thin Films

Ho, Soon Min (2016) Atomic Force Microscopy Studies on the Surface Morphologies of Chemical Bath Deposited CuS Thin Films. Oriental Journal of Chemistry, 32 (3). pp. 1515-1519. ISSN 0970-020 X

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Official URL: http://dx.doi.org/10.13005/ojc/320325

Abstract

In this work, copper sulphide thin films were deposited onto microscope glass slide by chemical bath deposition technique. The tartaric acid was served as complexing agent to chelate with Cu2+ to obtain complex solution. The influence of pH value on the surface morphologies of the films has been particularly investigated using the atomic force microscopy technique. The atomic force microscopy results indicate that the CuS films deposited at pH 1 were uniform, compact and pinhole free. However, the incomplete surface coverage observed for the films prepared at high pH (pH 2 and 2.5) values.

Item Type: Article
Additional Information: Scopus ID: 56701569600
Uncontrolled Keywords: Chemical bath deposition, Atomic force microscopy, Thin films, film thickness, surface roughness, copper sulphide
Subjects: T Technology > TA Engineering (General). Civil engineering (General)
Divisions: Faculty of Engineering, Science and Mathematics > School of Engineering and Quantity Surveying
Depositing User: Unnamed user with email masilah.mansor@newinti.edu.my
Date Deposited: 11 Aug 2016 08:09
Last Modified: 24 Nov 2016 08:02
URI: http://eprints.intimal.edu.my/id/eprint/486

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