Ho, Soon Min (2016) A review on copper oxide thin films. International Journal of Recent Scientific Research, 7 (6). pp. 11914-11918. ISSN 0976-3031
|
Text
A review on copper oxide thin films.pdf - Published Version Download (735kB) | Preview |
Official URL: http://recentscientific.com/welcome-ijrsr
Abstract
Copper oxide films have direct band gap of about 1.2 to 2.6eV. They could be used in many applications including solar cell, sensor and optoelectronic industry. The aim of this work is to investigate the properties of copper oxide thin films under various deposition methods. The obtained results based on the structure, optical, morphology and electrical properties are discussed. The overall results found that different researchers have reported different properties of copper oxide based on experimental conditions.
| Item Type: | Article |
|---|---|
| Additional Information: | Scopus ID: 56701569600 |
| Uncontrolled Keywords: | Thin films, cupric oxide, cuprous oxide, deposition, cuprous oxide, semiconductor. |
| Subjects: | T Technology > TA Engineering (General). Civil engineering (General) |
| Divisions: | Faculty of Engineering, Science and Mathematics > School of Engineering and Quantity Surveying |
| Depositing User: | Unnamed user with email masilah.mansor@newinti.edu.my |
| Date Deposited: | 11 Aug 2016 06:30 |
| Last Modified: | 24 Nov 2016 08:29 |
| URI: | http://eprints.intimal.edu.my/id/eprint/484 |
Actions (login required)
 |
View Item |
