Influence of complexing agent on the growth of chemically deposited Ni3Pb2S2 thin films

Ho, Soon Min (2014) Influence of complexing agent on the growth of chemically deposited Ni3Pb2S2 thin films. Oriental Journal of Chemistry, 30 (3). pp. 1009-1012. ISSN 0970-020 X

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Abstract

Ni 3 Pb 2 S 2 thin films were prepared by chemical bath deposition method. Here, the objective of this research is to investigate the influence of complexing agent on the properties of films.These films were characterized using atomic force microscopy, UV-Visible spectrophotometery and X-ray diffraction. It was found that the increase in the concentration of tartaric acid, film thickness increased, but, the band gap reduced. For the films prepared using 0.1M of tartaric acid, were found uniform and completely covered with the substrates.

Item Type: Article
Uncontrolled Keywords: thin films, chemical bath deposition, thickness, band gap.
Subjects: Q Science > QD Chemistry
Divisions: Faculty of Engineering, Science and Mathematics > School of Engineering and Quantity Surveying
Depositing User: Unnamed user with email masilah.mansor@newinti.edu.my
Date Deposited: 20 Jan 2016 02:11
Last Modified: 23 Sep 2016 02:24
URI: http://eprints.intimal.edu.my/id/eprint/46

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